Low temperature deposition of SiNx thin films by the LPCVD method - Tijanić, Zdenko; Ristić, Davor; Ivanda, Mile, inženjer fizike; Bogdanović-Radović, Ivančica; Marciuš, Marijan; Ristić, Mira; Gamulin, Ozren; Musić, Svetozar; Furić, Krešimir; Chiasera, Alessandro; Ferrari, Maurizio; Righini, Giancarlo Cesare (2012)
34th International Convention on Information and Communication Technology, Electronics and Microelectronics, Opatija, May 23-27, 2011
Bibliografija: 4 jed.
Keywords: Silicijev nitrid -- Tanki filmovi -- Niske temperature -- Taloženje -- Ramanova spektroskopija