NATO advanced study institute on process and device modeling for integrated circuit design

Permalink: http://skupni.nsk.hr/Record/fer.KOHA-OAI-FER:25150/Details
Glavni autor: Dutton, Robert W. (-)
Vrsta građe: Knjiga
Jezik: eng
Impresum: NATO, 1977.
Izdanje: 1. izd
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008 s1977 a |||||||||| ||eng|d
035 |a HR-ZaFER 29500 
040 |a HR-ZaFER  |b hrv  |c HR-ZaFER  |e ppiak 
041 |a eng 
100 1 |9 27178  |a Dutton, Robert W. 
245 |a NATO advanced study institute on process and device modeling for integrated circuit design :   |b silicon epitaxy and oxidation; bipolar models for statistical IC design; simulation of integrated circuits fabrication processes / 
250 |a 1. izd. 
260 |b NATO,  |c 1977. 
300 |a str.:  |b ilustr. ;  |c 30 cm. 
942 |c K  |2 udc 
990 |a 27556 
999 |c 25150  |d 25150