NATO advanced study institute on process and device modeling for integrated circuit design
Permalink: | http://skupni.nsk.hr/Record/fer.KOHA-OAI-FER:25150/Details |
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Glavni autor: | Dutton, Robert W. (-) |
Vrsta građe: | Knjiga |
Jezik: | eng |
Impresum: |
NATO,
1977.
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Izdanje: | 1. izd |
LEADER | 00666nam a2200181uu 4500 | ||
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005 | 20161104095942.0 | ||
008 | s1977 a |||||||||| ||eng|d | ||
035 | |a HR-ZaFER 29500 | ||
040 | |a HR-ZaFER |b hrv |c HR-ZaFER |e ppiak | ||
041 | |a eng | ||
100 | 1 | |9 27178 |a Dutton, Robert W. | |
245 | |a NATO advanced study institute on process and device modeling for integrated circuit design : |b silicon epitaxy and oxidation; bipolar models for statistical IC design; simulation of integrated circuits fabrication processes / | ||
250 | |a 1. izd. | ||
260 | |b NATO, |c 1977. | ||
300 | |a str.: |b ilustr. ; |c 30 cm. | ||
942 | |c K |2 udc | ||
990 | |a 27556 | ||
999 | |c 25150 |d 25150 |