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20210331162444.0 |
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ta |
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130520s2012 ci | |||| ||eng |
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|a (HR-ZaNSK)000852810
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|a HR-ZaNSK
|b hrv
|c HR-ZaNSK
|e ppiak
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|a croatica
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|a ci
|c hr
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|a 53
|2 MRF 1998.
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| 080 |
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|a 54
|2 MRF 1998.
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1 |
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|a Ristić, Davor
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| 245 |
1 |
0 |
|a Thermal decomposition of silicon-rich oxides deposited by the LPCVD method /
|c Davor Ristić, Mile Ivanda, Krešimir Furić, Alessandro Chiasera, Enrico Moser and Maurizio Ferrari.
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3 |
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|a Low Pressure Chemical Vapor Deposition
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| 300 |
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|b Ilustr.
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|a 34th International Convention on Information and Communication Technology, Electronics and Microelectronics, Opatija, May 23-27, 2011
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| 504 |
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|a Bibliografija: 13 jed.
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| 653 |
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0 |
|a Silicij
|a Oksidi
|a Toplinska razgradnja
|a Termogravimetrija
|a Tanki filmovi
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| 700 |
1 |
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|a Ivanda, Mile,
|c inženjer fizike
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| 700 |
1 |
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|a Furić, Krešimir
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| 700 |
1 |
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|a Chiasera, Alessandro
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| 700 |
1 |
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|a Moser, Enrico
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| 700 |
1 |
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|a Ferrari, Maurizio
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| 773 |
0 |
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|t Croatica chemica acta
|x 0011-1643
|g 85 (2012) 1 ; str. 91-96
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| 981 |
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|b B07/12
|p CRO
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| 998 |
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|a rpeo130903
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| 856 |
4 |
2 |
|u http://hrcak.srce.hr/index.php?show=clanak&id_clanak_jezik=119603
|y Elektronička verzija članka
|